DOI: 10.15330/pcss.16.2.253-256

А.І. Utkin, А.А. Yushkanov

Interaction of Electromagnetic H-wave with the thin Metal Film is Located on the Dielectric Substrate

Moscow State Regional University, 10a, Radio st., 105005, Moscow, Russia, e-mail:aiutkin@yandex.ru.

Interaction of electromagnetic H-wave with thin metal film is located between two dielectric environments ε₁, ε₂ in the case of different incident angles of H-wave θ and in the case of different reflection coefficients q₁ и q₂ is calculated in this article. Behavior analysis of reflection coefficient R, transmission coefficient T and absorption coefficient A in the case of its frequency dependence y and variation dielectric permeability of its environments is done.
Keywords: the thin metal film, electromagnetic H-wave, dielectric environments, reflection coefficient, transmission coefficient, absorption coefficient.

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